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Á¦ 2ȸ ½Å¼ºÀ嵿·ÂÀ» À§ÇÑ ALD Workshop
Korean & Chinese Joint Workshop
July 9th 2014
3rd floor seminar room
POSCO P&S Teheranro Seoul
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½Ã°£³»¿ë°¿¬¿¬»ç09:00 ~ 09:20registration¡¡09:20 ~ 09:30Opening remarkÁ¤Áø¿í ±³¼ö (ÇѾç´ë)09:30 ~ 10:10»ê¾÷±â¼ú ¹× ³ª³ë R&DÃßÁø¹æÇâKEIT °íº´Ã¶ PD10:10 ~ 10:20coffee break¡¡10:20 ~ 11:20ALD : Basics and applications±èÇüÁØ ±³¼ö (¿¬¼¼´ë)11:20 ~ 11:30coffee break¡¡11:30 ~ 12:30Atomic Layer Deposition for Display Applications¹ÚÁø¼º ±³¼ö (ÇѾç´ë)12:30 ~ 13:30lunch¡¡13:30 ~ 14:00Nanoscale functionalization of textiles using atomic layer depositionÀÌÅÂÀ± ±³¼ö (¿¬¼¼´ë)14:00 ~ 14:30Atomic Layer Deposition for Improving Performance and Safety of Li-ion BatteriesÁ¤À±¼® ±³¼ö (UNIST)14:30 ~ 15:00Atomic-scale Control of Functional Nano-Materials by Atomic Layer DepositionÀÌ»ó¿î ±³¼ö (¾ÆÁÖ´ë)15:00 ~ 15:10coffee break¡¡15:10 ~ 15:40Atomic Layer Deposition for Optical Microcavities Fudan univ. Yongfeng Mei15:40 ~ 16:10Amorphous In-Ga-Zn-O thin film transistor memory with atomic-layer-deposited gate stacksFudan univ. Shi-Jin Ding16:10 ~ 16:40Effect of Conformal ALD Coating on Stability of 1-DNanostructuresNanjing Tech univ. Yang Yang16:40 ~ 16:50coffee break¡¡16:50 ~ 17:20¹ÝµµÃ¼ »ê¾÷¿¡¼ÀÇ ALD ÀÀ¿ë ¹× ¿¬±¸µ¿ÇâSK Hynix Á¶È£Áø ¹Ú»ç17:20 ~ 17:50Atomic Layer Deposition for industrial applicationsSK Innovation ±èÁøÇõ ¹Ú»ç17:50 ~ 18:00Closing remark¹ÚÁø¼º ±³¼ö (ÇѾç´ë)[µî·Ïºñ]
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