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2ȸ ½Å¼ºÀ嵿·ÂÀ» À§ÇÑ ALD Workshop


Korean & Chinese Joint Workshop

 

July 9th 2014

3rd floor seminar room

POSCO P&S Teheranro Seoul


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09:00 ~ 09:20registration¡¡
09:20 ~ 09:30Opening remarkÁ¤Áø¿í ±³¼ö (ÇѾç´ë)
09:30 ~ 10:10»ê¾÷±â¼ú ¹× ³ª³ë R&DÃßÁø¹æÇâKEIT °íº´Ã¶ PD
10:10 ~ 10:20coffee break¡¡
10:20 ~ 11:20ALD : Basics and applications±èÇüÁØ ±³¼ö (¿¬¼¼´ë)
11:20 ~ 11:30coffee break¡¡
11:30 ~ 12:30Atomic Layer Deposition for Display Applications¹ÚÁø¼º ±³¼ö (ÇѾç´ë)
12:30 ~ 13:30lunch¡¡
13:30 ~ 14:00Nanoscale functionalization of textiles using atomic layer depositionÀÌÅÂÀ± ±³¼ö (¿¬¼¼´ë)
14:00 ~ 14:30Atomic Layer Deposition for Improving Performance and Safety of Li-ion BatteriesÁ¤À±¼® ±³¼ö (UNIST)
14:30 ~ 15:00Atomic-scale Control of Functional Nano-Materials by Atomic Layer DepositionÀÌ»ó¿î ±³¼ö (¾ÆÁÖ´ë)
15:00 ~ 15:10coffee break¡¡
15:10 ~ 15:40Atomic Layer Deposition for Optical Microcavities Fudan univ. Yongfeng Mei
15:40 ~ 16:10Amorphous In-Ga-Zn-O thin film transistor memory with atomic-layer-deposited gate stacksFudan univ. Shi-Jin Ding
16:10 ~ 16:40Effect of Conformal ALD Coating on Stability of 1-D
Nanostructures
Nanjing Tech univ. Yang Yang
16:40 ~ 16:50coffee break¡¡
16:50 ~ 17:20¹ÝµµÃ¼ »ê¾÷¿¡¼­ÀÇ ALD ÀÀ¿ë ¹× ¿¬±¸µ¿ÇâSK Hynix Á¶È£Áø ¹Ú»ç
17:20 ~ 17:50Atomic Layer Deposition for industrial applicationsSK Innovation ±èÁøÇõ ¹Ú»ç
17:50 ~ 18:00Closing remark¹ÚÁø¼º ±³¼ö (ÇѾç´ë)


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200,000¿ø

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220,000¿ø

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120,000¿ø

- ¹«ÅëÀå ÀÔ±Ý ¾È³» : ¾¾Æ¼ÀºÇà 186-00198-258 Çѱ¹Á¤º¸µð½ºÇ÷¹ÀÌÇÐȸ Àåºñ¿¬±¸È¸ 


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»çÀüµî·Ï ±â°£ | by July 2nd


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